SAN JOSE – Cadence Design Systems Inc. here today (May 7) announced it has acquired K2 Technologies Inc., a supplier of software for photomask data preparation applications. With the acquisition of K2 ...
LONDON — GenISys has started sampling to designers of MEMS based devices, sensors and flat panel displays a flexible simulation platform for mask aligner lithography that lets them virtually model, ...
The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design ...
The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and ...
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